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USM-E Electron Microscope
• A versatile, high-performance platform for in situ surface analysis.
• Enables real-time observation of dynamic surface processes.
• Captures and analyses microscopic surface dynamics.
• Utilizes surface-sensitive electron imaging and analysis technology to achieve sub-monolayer detection sensitivity.
• Ideal for advanced research in Ultrathin films, Two-dimensional materials, Metals, Semiconductors, Magnetic materials, and Nanomaterials.
Specifications
| Specifications | |
|---|---|
| Cathode |
Schottky Field Emission Sources Spin-polarized electron source (optional) |
| Resolution | ≤ 5 nm (nac); ≤2nm (ac) |
| Field of View | 1 μm – 200 μm |
| Sample Temperature |
RT – 2000 K 10 K – RT (optional) |
| Base Vacuum | ≤ 5×10-10 mbar(main chamber) |
Imaging mode and mechanism
| Measurement Modes |
|---|
| BF-LEEM |
| DF-LEEM |
| MEM |
| LEED / μLEED |
| I–V LEEM |
| SPLEEM (optional) |
| Information |
|---|
| Reflectivity / Phase contrast |
| Crystal domains / Diffraction contrast |
| Surface potential |
| Reciprocal-space structure |
| Electronic structure / Film thickness |
| Magnetism |
| Application scenarios：In-situ CVD Growth Observation |
| Application scenarios：Ultrathin Film Layer Calibration |